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GOLD / SILVER CLEANER
Gold/Silver Cleaner는 현재 미국 Siemens Medical System과 Package 업체 및 국내 Bumping 회사, PCB업체에 납품하고 있는 제품입니다. Gold/Silver Cleaner는 Wire bonding이나 후공정 전, Gold bond pads와의 bond를 향상, Gold 표면 유지등에 사용되고 있습니다. G/S Cleaner를 사용하게 되면 용액의 Thiol Group으로 인하여 Metal Surface가 활성화 되고, Adhesion 및 전도성이 향상됩니다. 사용방법은 상온에서 Wafer를 수십초 dipping하고 DI Water로 Rinse하시면 됩니다. PROPERTIES :
FEATURES :
• Rapid, economical cleaning
• Enhances fluxing, soldering, etching, plating, and coating
• No adverse electrical effects
• Mild pH
• Compatible with most metals
• Non-aggressive formulation
• Cyanide-free
APPLICATION :
• 필요에 따라서 Substrates를 먼저 degrease 합니다.
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Positive Photomask Cleaner (PPC 1-1)
TRANSENE Positive Photomask Cleaner 1-1 is a non-hazardous water miscible cleaner for critical photomask cleaning applications.
PPC 1-1 may be used on a variety of delicate mask substrates including iron oxide, chrome, or emulsion without damaging the surface.
PROPERTIES :
APPLICATIONS :
• Prior to further processing, the photomask should be submerged in Positive Photomask Cleaner PPC 1-1.
• Cleaning is enhanced by ultrasonic or megasonic agitation.
• Alternatively, manual scrubbing is effective.
• Care should be taken not to damage the part while scrubbing gently.
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Ultra Clean Surfaces TRANSENE 100
FEATURES :
• Stabilization of semiconductor devices through clean surfaces
• Overcomes soft reverse characteristics when due to surface contaminants
• Generates higher yield of p-n juncton devices.
• Useful for final cleaning process before thermal oxidation of silicon, diffusion and after p-n junction etches.
What is TRANSENE-100
TRANSENE-100 is a new chemical product designed for use in the semiconductor industry, to improve quality, yields, and reliability of p-n junction devices. It is especially applicable to transistors, diodes, rectifiers, and intergrated circuits. TRANSENE-100 serves to establish clean surfaces and ensure surface stabillization of semiconductor devices when it is properly used.
PROPERTIES :
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WAXSTRIP L2X WaxStrip L2X is an environmentally safe concentrate prepared primarily for the removal of mounting waxes in semiconductor processing. In addition to its ability to solvate waxes and oils, WaxStrip L2X can be used for removal of silicones, greases, soils, finishing compounds, and normal contaminants. WaxStrip L2X is compatible for use on iron, silicon, glass, aluminum zinc, brass, copper, and magnesium.
APPLICATION :
• Combine WaxStrip L2X with eionized water in equal amounts.
• Bring solution to a temperature of 50℃ to 70℃ and immerse parts to be cleaned.
• Rinse parts thoroughly.
Note : Ultrasonic agitation greatly enchances the cleaning process and reduces cleaning time.
ETC :
WaxStrip L2X is a registered trademark of TRANSENE COMPANY, INC.
Technical information and recommendations herein stated concerning application of these products are based on reliable laboratory tests and believed to be accurate.
No statements are to be construed as a license under existing patents. No warranty is expressed as to results obtained from these materials whether used singly or in combination with other materials.
Available in 3.78L(1 gallon), 18.9L(5 gallons) or 207.9L(55 gallons) Units. |
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TRANSENE Flux Remover TFR-220DG
TFR-220DG는 PCB, Connectors, Hybrids의 세정을 위하여 제작된 Ozone-safe Flux 제거 및 그리스 제거에 유용한 제품이니다. TFR-220DG는 합성체, 물에 용해된 형태, rosin, 오염된 Flux, 그리스 등의 모든 Type의 Flux를 효과적으로 제거하는 지방성 탄화수고의 제품입니다.
자극성이 적은 냄새의 TFR-220DG는 PCBs, Stencils, Gaskets, Housings, Wiring Harnesses 및 다른 전자 부품에 알맞습니다. 소수성과 친수성 작용으로 TFR-220DG는 Organic 및 Ionic deposits을 제거합니다. TFR-220는 Rinse가 필요 없이 완전히 제거되어 건조됩니다. TRANSENE TFR-220DG는 불연성의 환경친화적인 제품입니다.
PROPERTIES :
FEATURES :
• Ozone에 전혀 영향 없음.
• 고순도
• 완전 소멸
• 모든 Type의 Flux 제거
• 그리스 제거 |
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TRANSENE Ultrasonic Detergent TUD TRANSENE Ultrasonic Detergent (TUD) is general purpose cleaner used for silicon and other semiconductor materials soiled in slicing, lapping or polishing. It is also used to clean electronic parts. The detergent formulation is multiple acting with especially good solvent action. It exhibits high sequesterng ability, very strong surface activity and suspension and emulsification properties. Surface contaminants normally resistant to conventional detergents are readily removed.
The detergent power is based on a balanced product formulation. Highly active surfactants reduce surface tension to below 35 dynes/cm. An effective hydrophilic-hydrophobic balance is maintained. As a result of the detergent-water interface (which penetrates around soils and durface contaminants) ultrasonic action in cleaning is enhanced.
Phosphates and polyphosphates present as inorganic binders, in optimized concentration add to the detergency and provide proper pH and buffer capacity.
Glycol etcher solvents blend with water to extend solvent action to a variety of soils and contaminants. This lends the formulation its unique ability to remove wax, scums, greases and other hydrophobic soils.
Chelating agents are purposely added to complex heavy metal impurities. The product is not sensitive to hard water because of the water-softening agent.
Coupling materials or hydrotropes are also added to insure stability over a range of temperature conditions.
Finally, a non-oonic water-soluble thickening agent is used to impart the desired viscosity.
APPLICATION :
TRANSENE Ultrasonic Detergent (TUD) is supplied as a liquid concentration to be diluted with water - 4 ounces of the concentrate is used to make one gallon of detergent solution. The solution is used hot or at room temperature, preferably ultrasonically, for rapid, efficient cleaning. Excessive sudsing will not be encountered. The detergent is readily rinsed off with demineralized water.
FEATURES :
• All purpose cleaner
• High sequestering power
• Enhanced Ultrasonic detergent action
• Good rinsability
• Economical used as a liquid concentrate
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MSE : 02-2275-9510 팩스 : 02-2278-5446